Multichamber UHV system

Technical Data

Vacuum: up to 10-11 mbar
Thermal evaporation: four vapour sources
Evaporation rate: from 0 to 5 nm/min
Thickness measurement accuracy: <10%

There is possibility to conduct in-situ measurements using LEED technique or Auger Spectrometer:

Beam diameter: about 0,5 mm
Electron energy: to 700 eV (LEED)
to 3000 eV (Auger)

 

Application

Thin film and multilayer fabrication, surface chemical analysis, determination of surface crystallographic structure.