Two-Beam Ion Implanter

Technical Data:

Main ion beam (most elements available)   
Magnetic control: dM/M = 1/350, near 5mA
Beam spot: up to 10x120 mm
Secondary ion beam (all noble gases) accelerated with 5-45 kV
Densities: near 500 mA/cm2

Applications:

Creation of bioactive coatings layers. As coating layers the carbon based coatings and HAP are preferred; corrosion resistive coatings wear resistive coating based on carbon (e.g. DLC, SiC)

Additional Informations

Department in which the equipment is in use:

Zakład Materiałów Magnetycznych i Nanostruktur (NZ34)