Vacuum Univex 300 E-Beam Evaporation System

LEYBOLD AG; 1996

Technical Data:

3 x 10-6 torr base vacuum. Beam energy up to 6.0 KeV, 3.6 KW power supply

Applications:

Deposition of thin films, micro/nano-particles Targets: Ni, Ag, Cr, Ti, Fe, Au.

Department in which the equipment is in use:

Department of Nuclear Reactions and Strong Interactions Mechanism